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Netherlands – Laboratory, optical and precision equipments (excl. glasses) – European Tender Two Parallel Plate Plasma-enhanced Chemical Vapor Deposition (PECVD) Systems

Awarded Contract award No deadline published

Description

The University of Twente is tendering to purchase two new Plasma-Enhanced Chemical Vapor Deposition systems. The MESA+ Institute will invest in two new systems for deposition of (doped) dielectric thin films to upgrade and reinforce their state-of-the-art thin film technology and processing capacity. The systems will be used for moderate-temperature deposition of low stress thin films. For the following materials: silicon dioxide (SiO2) boron-doped SiO2 (BSG) phosphorus-doped SiO2 (PSG) boron-phosphorus-doped SiO2 (BPSG) low-stress silicon nitride (SiNx) silicon oxynitride (SiOxNy) amorphous silicon (aSi)

Official source

Source: TED — Tenders Electronic Daily (Publications Office of the EU)

Always verify details on the official notice.

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